The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 2018

Filed:

Mar. 30, 2016
Applicant:

Sumitomo Chemical Company, Limited, Tokyo, JP;

Inventors:

Masako Sugihara, Osaka, JP;

Takashi Nishimura, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01); C08F 212/02 (2006.01); C08F 216/10 (2006.01); C08F 216/12 (2006.01); C08F 216/14 (2006.01); G03F 7/039 (2006.01); G03F 7/075 (2006.01); G03F 7/085 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); C08F 212/02 (2013.01); C08F 216/10 (2013.01); C08F 216/12 (2013.01); C08F 216/14 (2013.01); G03F 7/0045 (2013.01); G03F 7/0397 (2013.01); G03F 7/0751 (2013.01); G03F 7/085 (2013.01);
Abstract

A resist composition contains: a resin having an acid-labile group, a resin having a structural unit represented by formula (I), an acid generator, and a solvent; wherein Rrepresents a hydrogen atom or a methyl group, Rrepresents a Cto Chydrocarbon group that may be substituted with a hydroxy group, a Cto Cacyl group or a hydrogen atom, Rin each occurrence independently represents a Cto Calkyl group or a Cto Calkoxy group, 'p' represents an integer of 0 to 4, Z represents a divalent Cto Chydrocarbon group having a group represented by formula (Ia), and a methylene group contained in the hydrocarbon group may be replaced by an oxygen atom, a sulfur atom or a carbonyl group, *—[(CH)—O]— (Ia): wherein 'w' and “r” each independently represents an integer of 1 to 10, and * represent a bonding position.


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