The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2018
Filed:
Nov. 08, 2016
Schlumberger Technology Corporation, Houston, TX (US);
Philip S. Cheung, Wadhurst, GB;
Tianhua Zhang, Clamart, FR;
SCHLUMBERGER TECHNOLOGY CORPORATION, Sugar Land, TX (US);
Abstract
Methods and systems for obtaining an electrical impedivity and/or resistivity image of a subterranean formation are provided. The electrical impedivity and/or resistivity image can be obtained by determining first formation impedivity data and second formation impedivity data. The first formation impedivity data can be based on a component of the measured impedance data orthogonal a downhole fluid impedance. The second formation impedivity data can be based on an amplitude of the measured impedance data. A combined formation impedivity data can be obtained by combining a portion of the first formation impedivity data based on a first formation impedivity determination process with a portion of the second formation impedivity data based on a second formation impedivity determination process. The electrical impedivity and/or resistivity image of the subterranean formation can then be obtained by using the combined formation impedivity data.