The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 2018

Filed:

Aug. 31, 2015
Applicants:

Mathias M. Schubert, Lincoln, NE (US);

Tino Hofmann, Lincoln, NE (US);

David S. Hage, Hickman, NE (US);

Erika Pfaunmiller, Lincoln, NE (US);

Craig M. Herzinger, Lincoln, NE (US);

John A. Woollam, Lincoln, NE (US);

Stefan Schoeche, Lincoln, NE (US);

Inventors:

Mathias M. Schubert, Lincoln, NE (US);

Tino Hofmann, Lincoln, NE (US);

David S. Hage, Hickman, NE (US);

Erika Pfaunmiller, Lincoln, NE (US);

Craig M. Herzinger, Lincoln, NE (US);

John A. Woollam, Lincoln, NE (US);

Stefan Schoeche, Lincoln, NE (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/21 (2006.01); G01N 21/23 (2006.01); G01J 4/04 (2006.01);
U.S. Cl.
CPC ...
G01N 21/211 (2013.01); G01J 4/04 (2013.01); G01N 21/23 (2013.01);
Abstract

Ellipsometers and polarimeters or the like to investigate analyte containing fluids applied to a substrate-stage having a multiplicity of nano-structures that project non-normal to a surface thereof, including dynamics of interaction therewith, to the end of evaluating and presenting at least partial Jones or Mueller Matricies corresponding to a multiplicity of locations over an imaged area.


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