The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 2018

Filed:

Jan. 13, 2009
Applicants:

NO MA Kim, Daejeon, KR;

Jae Gwan Lee, Daejeon, KR;

An NA Lee, Daejeon, KR;

Inventors:

No Ma Kim, Daejeon, KR;

Jae Gwan Lee, Daejeon, KR;

An Na Lee, Daejeon, KR;

Assignee:

LG Chem, Ltd., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); C09J 133/14 (2006.01); C08F 220/18 (2006.01); C09D 133/06 (2006.01); C09J 133/00 (2006.01); G02B 5/30 (2006.01); C08F 220/28 (2006.01); C08K 5/00 (2006.01); C08K 5/43 (2006.01);
U.S. Cl.
CPC ...
C09J 133/14 (2013.01); C08F 220/18 (2013.01); C09D 133/06 (2013.01); C09J 133/00 (2013.01); B32B 2457/202 (2013.01); C08F 2220/1825 (2013.01); C08F 2220/1883 (2013.01); C08F 2220/281 (2013.01); C08F 2220/286 (2013.01); C08K 5/0025 (2013.01); C08K 5/43 (2013.01); C09J 2201/606 (2013.01); G02B 5/30 (2013.01); G02F 2202/28 (2013.01); Y10T 428/105 (2015.01); Y10T 428/1059 (2015.01); Y10T 428/1077 (2015.01); Y10T 428/1082 (2015.01); Y10T 428/2848 (2015.01); Y10T 428/2857 (2015.01);
Abstract

The present invention relates to an acrylic pressure-sensitive adhesive composition, and more particularly, to an acrylic pressure-sensitive adhesive composition capable of showing an excellent anti-static performance, and solving a transferring problem of additives and a problem concerning a balance of low-rate and high-rate peel strength, by comprising a) an acrylic copolymer including a monomer having a functional group capable of chelating with a metal salt, and a hydrophobic monomer and b) a metal salt.


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