The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 2018

Filed:

Jul. 14, 2015
Applicants:

Research Institute of Shaanxi Yanchang Petroleum (Group) Co., Ltd., Xi'an, Shaanxi, CN;

Dalian University of Technology, Dalian, Liaoning Province, CN;

Inventors:

Jiuchang He, Xi'an, CN;

Wei Zhang, Xi'an, CN;

Xiongfu Zhang, Xi'an, CN;

Dapeng Li, Xi'an, CN;

Ruimin Gao, Xi'an, CN;

Yongbin Lu, Xi'an, CN;

Shuqin Zhang, Xi'an, CN;

Mingfeng Wang, Xi'an, CN;

Pengju Huo, Xi'an, CN;

Si Li, Xi'an, CN;

Yuan Zhang, Xi'an, CN;

Zhiling Liu, Xi'an, CN;

Gang Chen, Xi'an, CN;

Ting Pei, Xi'an, CN;

Hua Zhang, Xi'an, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 39/40 (2006.01);
U.S. Cl.
CPC ...
C01B 39/40 (2013.01); C01P 2004/04 (2013.01); C01P 2004/34 (2013.01); C01P 2004/38 (2013.01); C01P 2004/62 (2013.01);
Abstract

A method for directly preparing an empty shell type small grain ZSM-5 molecular sieve. The method comprises: uniformly mixing and stirring an organic template agent, a silicon source and water; dripping an aqueous solution of an aluminum source into the mixture; preserving room temperature, and continuously stirring for a period of time; and performing hydrothermal crystallization, and washing, drying and roasting the obtained product to obtain the molecular sieve. The molecular sieve has high degree of crystallinity and uniform particle size. Moreover, the method requires short time, simple operation and only one step, no extra surfactant is needed, and secondary acid and alkali treatment is not needed.


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