The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 2018

Filed:

May. 22, 2015
Applicant:

President and Fellows of Harvard College, Cambridge, MA (US);

Inventors:

Jie Shen, Worcester, MA (US);

Wei Sun, Brookline, MA (US);

Peng Yin, Brookline, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B82B 3/00 (2006.01); B82Y 5/00 (2011.01); B82Y 40/00 (2011.01); H01L 21/302 (2006.01); B82Y 30/00 (2011.01);
U.S. Cl.
CPC ...
B82B 3/0047 (2013.01); B82Y 5/00 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); B01J 2219/00659 (2013.01);
Abstract

The present disclosure relates to the alignment of moieties (e.g., nanoparticles and/or nanowires) into prescribed architectures on two- and/or three-dimensional substrates (e.g., nucleic acid nanostructures/crystals). The present disclosure also relates to a nucleic acid (e.g., DNA) lithography method that includes, in some embodiments, adsorbing a bare nucleic acid nanostructure onto a surface of a substrate, and etching the surface of the substrate containing the bare nucleic acid nanostructure, thereby producing a patterned substrate.


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