The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2018
Filed:
Aug. 10, 2015
Veeco Instruments Inc., Plainview, NY (US);
Ray Logue, Henderson, NV (US);
Don Sirota, Poughkeepsie, NY (US);
Karthik Karkala, Wappinger Falls, NY (US);
Eric Armour, Pennington, NJ (US);
Christopher A. Morath, Basking Ridge, NJ (US);
Arindam Sinharoy, Furlong, PA (US);
Veeco Instruments Inc., Plainview, NY (US);
Abstract
Mass-transfer rate control arrangement and method in which a process precursor mixture is produced containing carrier gas and a process precursor gas. A quantity of the process precursor present in the process precursor mixture is acoustically sensed to produce a sensor output. A dilution gas is provided and the process precursor mixture and the dilution gas are separately conveyed to a dilution point, at which a diluted mixture of the dilution gas and the process precursor mixture is achieved. A relative flow rate of the carrier gas and the dilution gas is automatically controlled in response to the sensor output such that the diluted mixture at the dilution point has a prescribed mass transfer rate of the precursor gas.