The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 09, 2018

Filed:

Jul. 14, 2015
Applicant:

Dexerials Corporation, Tokyo, JP;

Inventors:

Yutaka Muramoto, Miyagi, JP;

Masanao Kikuchi, Miyagi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); C23C 14/08 (2006.01); C23C 14/34 (2006.01); C23C 16/27 (2006.01); C23C 16/44 (2006.01); C23C 16/56 (2006.01); C23C 28/04 (2006.01); G03F 7/20 (2006.01); B29C 33/38 (2006.01); G03F 7/004 (2006.01); G03F 7/11 (2006.01); G03F 7/24 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 33/3857 (2013.01); C23C 14/083 (2013.01); C23C 14/34 (2013.01); C23C 16/27 (2013.01); C23C 16/44 (2013.01); C23C 16/56 (2013.01); C23C 28/046 (2013.01); G03F 7/0043 (2013.01); G03F 7/11 (2013.01); G03F 7/2053 (2013.01); G03F 7/24 (2013.01); G03F 7/70025 (2013.01);
Abstract

There is provided a method for manufacturing a master on which an arbitrary pattern is formed, the method including: forming a thin-film layer on an outer circumferential surface of a base material in a round cylindrical or round columnar shape; generating a control signal corresponding to an object on the basis of an input image in which the object is depicted; irradiating the thin-film layer with laser light on the basis of the control signal and thereby forming a thin-film pattern corresponding to the object on the thin-film layer; and forming a pattern corresponding to the object on the outer circumferential surface of the base material using, as a mask, the thin-film layer on which the thin-film pattern is formed.


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