The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 09, 2018

Filed:

Mar. 27, 2015
Applicant:

Samsung Display Co. Ltd., Yongin, Gyeonggi-Do, KR;

Inventors:

Kwang Woo Park, Hwaseong-si, KR;

Jun Hyuk Woo, Seongnam-si, KR;

Jeong Won Kim, Seoul, KR;

Seung Bo Shim, Asan-si, KR;

Jin Ho Ju, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/52 (2012.01); G02B 5/20 (2006.01); G03F 1/54 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/54 (2013.01); G03F 7/203 (2013.01); G03F 7/2024 (2013.01);
Abstract

A photomask is provided. A photomask, comprising: a transparent substrate; and a plurality of filter layers disposed on the transparent substrate, wherein the filter layers include a first filter layer, which selectively transmits first-wavelength light therethrough, and a second filter layer, which selectively transmits second-wavelength light therethrough.


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