The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2018
Filed:
Feb. 18, 2015
Centre National DE LA Recherche Scientifique—cnrs, Paris, FR;
Ecole Polytechnique, Palaiseau, FR;
Dominique Pagnoux, Limoges, FR;
Jérémy Vizet, Limoges, FR;
Sandeep Manhas, Limoges, FR;
Jean-Charles Vanel, Paris, FR;
Stanislas Deby, Boulogne Billancourt, FR;
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE-CNRS, Paris, FR;
Ecole Polytechnique, Palaiseau, FR;
Abstract
According to one aspect, the invention relates to a device () for remote polarimetric characterization of a sample (S). It comprises a source () for emitting at least one incident light wave at at least one first wavelength (λ); a monomode optical fiber () in which the incident light wave is intended to propagate; a polarization state generator (PSG) arranged on the proximal side of the optical fiber; a reflector () intended to be arranged on the distal side of the optical fiber; a polarization state analyzer (PSA) arranged on the proximal side of the optical fiber and allowing, for each probe state of the incident wave generated by the polarization state generator, the polarization of the light wave obtained after propagation of the incident wave in the optical fiber (), reflection from the distal side of the optical fiber and reverse propagation in the optical fiber (), to be analyzed. Processing means () make it possible to determine, from a first polarimetric characterization of the optical fiber, a Mueller matrix (M) associated with the optical fiber, and, from a second polarimetric characterization of the assembly comprising the optical fiber and the sample, a Mueller matrix (M) associated with said assembly. The Mueller matrix (M) associated with the sample is determined from the Mueller matrices associated with the optical fiber and the assembly comprising the optical fiber and the sample, respectively.