The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 09, 2018

Filed:

Nov. 02, 2016
Applicant:

Sysmex Corporation, Kobe-shi, Hyogo, JP;

Inventors:

Kazuhiro Yamada, Kobe, JP;

Takeshi Yamamoto, Kobe, JP;

Assignee:

SYSMEX CORPORATION, Kobe-shi, Hyogo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 15/14 (2006.01); G01N 21/53 (2006.01); G01N 15/00 (2006.01); G01N 15/10 (2006.01);
U.S. Cl.
CPC ...
G01N 15/1436 (2013.01); G01N 15/1459 (2013.01); G01N 21/53 (2013.01); G01N 2015/0065 (2013.01); G01N 2015/1006 (2013.01); G01N 2201/068 (2013.01);
Abstract

A particle measuring apparatus includes a flow cell configured to flow a specimen, a first light source configured to emit light having a first wavelength, and a second light source configured to emit light having a second wavelength different from the first wavelength. An irradiation optical system is configured to irradiate the flow cell with light emitted from the first light source and the second light source. The irradiation optical system includes a dichroic mirror configured to transmit the light emitted from the first light source and reflect the light emitted from the second light source, and a light collecting lens configured to collect the light emitted from the first and second light sources and passed through the dichroic mirror at the flow cell. The second light source and the dichroic mirror are turnable about rotation axis that are orthogonal to one another.


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