The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2018
Filed:
Mar. 17, 2015
Nikon Corporation, Tokyo, JP;
Toshio Yoshinari, Machida, JP;
NIKON CORPORATION, Tokyo, JP;
Abstract
A method for manufacturing an SiO—TiObased glass upon a target by a direct method, includes: an ingot growing step of growing an SiO—TiObased glass ingot having a predetermined length on the target by flame hydrolysis by feeding a silicon compound and a titanium compound into an oxyhydrogen flame, wherein the ingot growing step includes: a first step of increasing a ratio of a feed rate of the titanium compound to a feed rate of the silicon compound as the SiO—TiObased glass ingot grows until the ratio reaches a predetermined value; and a second step of gradually growing the SiO—TiObased glass ingot after the ratio has reached the predetermined value in the first stage with keeping the ratio within a predetermined range.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile