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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10090467 B1

PDFFull Text
Expired
Date of Patent:
Oct. 02, 2018

Filed:

Oct. 15, 2015

Deposition mask, deposition device, deposition method, and deposition mask manufacturing method

Applicant:

Sharp Kabushiki Kaisha, Sakai, JP;

Inventors:

Shinichi Kawato, Sakai, JP;

Manabu Niboshi, Sakai, JP;

Yuhki Kobayashi, Sakai, JP;

Kazuo Takizawa, Sakai, JP;

Assignee:

SHARP KABUSHIKI KAISHA, Sakai, JP;

Attorney:

Morrison & Foerster LLP

Primary Examiner:

Tony Tran

Int. Cl.
CPC ...
H01L 51/00 (2006.01); C23C 14/04 (2006.01); H01L 51/50 (2006.01); H05B 33/10 (2006.01); C23C 14/02 (2006.01); H01L 51/56 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0011 (2013.01); C23C 14/02 (2013.01); C23C 14/04 (2013.01); C23C 14/042 (2013.01); H01L 51/50 (2013.01); H01L 51/5012 (2013.01); H01L 51/56 (2013.01); H05B 33/10 (2013.01);
Abstract

A magnetic material section is provided on a mask substrate so as to be interposed between Y aperture lines of the mask substrate and between X aperture line of the mask substrate. A portion of the magnetic material section which portion is interposed between the X aperture lines has a first thickness and a second thickness which is less than the first thickness, the first thickness being that of each sub-portion thereof which is positioned between mutually adjacent ones of the Y aperture lines, the second thickness being that of each sub-portion thereof which is positioned between apertures which are mutually adjacent in a Y direction.

Find Patent Forward Citations

Kawato, Shinichi. (2018). Deposition mask, deposition device, deposition method, and deposition mask manufacturing method (U.S. Patent No. 10090467). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10090467

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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