The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 02, 2018

Filed:

Nov. 17, 2016
Applicants:

Kevin Chen, Berkeley, CA (US);

Rehan Kapadia, Los Angeles, CA (US);

Ali Javey, Lafayette, CA (US);

Inventors:

Kevin Chen, Berkeley, CA (US);

Rehan Kapadia, Los Angeles, CA (US);

Ali Javey, Lafayette, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/04 (2006.01); C30B 1/10 (2006.01); H01L 21/02 (2006.01); C30B 1/02 (2006.01); C30B 29/40 (2006.01); C30B 25/02 (2006.01);
U.S. Cl.
CPC ...
C30B 1/10 (2013.01); C30B 1/02 (2013.01); C30B 25/02 (2013.01); C30B 25/04 (2013.01); C30B 29/40 (2013.01); C30B 29/403 (2013.01); H01L 21/02422 (2013.01); H01L 21/02428 (2013.01); H01L 21/02488 (2013.01); H01L 21/02543 (2013.01);
Abstract

This disclosure provides systems, methods, and apparatus related to the growth of single crystal III-V semiconductors on amorphous substrates. In one aspect, a shape of a semiconductor structure to be formed on an amorphous substrate is defined in a resist disposed on the amorphous substrate. A boron group element is deposited over the amorphous substrate. A ceramic material is deposited on the boron group element. The resist is removed from the amorphous substrate. The ceramic material is deposited to cover the boron group element. The amorphous substrate and materials deposited thereon are heated in the presence of a gas including a nitrogen group element to grow a single crystal semiconductor structure comprising the boron group element and the nitrogen group element.


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