The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2018
Filed:
Sep. 21, 2017
Applicants:
Korea Advanced Institute of Science and Technology, Daejeon, KR;
SK Innovation Co., Ltd., Seoul, KR;
Inventors:
Jin Su Ham, Daejeon, KR;
Yeon Sik Jung, Daejeon, KR;
Sun Young Kim, Daejeon, KR;
Yoon Hyung Hur, Daejeon, KR;
Kwang Kuk Lee, Daejeon, KR;
Seung Won Song, Daejeon, KR;
Assignees:
SK Innovation Co., Ltd., Seoul, KR;
Korea Advanced Institute of Science and Technology, Daejeon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 214/18 (2006.01); C08F 212/08 (2006.01); C08F 220/14 (2006.01); C08F 220/18 (2006.01); C08F 293/00 (2006.01); C08F 4/04 (2006.01); C08F 212/14 (2006.01); G01Q 60/24 (2010.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
C08F 214/18 (2013.01); C08F 212/08 (2013.01); C08F 220/14 (2013.01); C08F 220/18 (2013.01); C08F 293/005 (2013.01); C08F 4/04 (2013.01); G01Q 60/24 (2013.01); H01J 37/28 (2013.01);
Abstract
Provided is a diblock copolymer comprising a first block having a repeating unit represented by the following Chemical Formula 1, and a second block having a repeating unit represented by the following Chemical Formula 2: