The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2018
Filed:
Mar. 18, 2015
Omron Corporation, Kyoto, JP;
Takeshi Shoji, Hirai Kusatsu, JP;
John Drinkard, Foster City, CA (US);
Ambrish Tyagi, Palo Alto, CA (US);
Omron Corporation, Kyoto, JP;
Abstract
According to one aspect of the teachings herein, a method and apparatus detect mechanical misalignments in a machine vision system during run-time operation of the machine vision system, and compensate image processing based on the detected misalignments, unless the detected misalignments are excessive. Excessive misalignments may be detected by determining a worst-case error based on them. If the worst-case error exceeds a defined limit, the machine vision system transitions to a fault state. The fault state may include disrupting operation of a hazardous machine or performing one or more other fault-state operations. Among the detected misalignments are internal misalignments within individual cameras used for imaging, and relative misalignments between cameras. The method and apparatus may further perform run-time verifications of focus and transition the machine vision system to a fault state responsive to detecting insufficient focal quality.