The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2018
Filed:
May. 22, 2017
Applicant:
Globalfoundries Inc., Grand Cayman, KY;
Inventors:
Shiv Kumar Mishra, Mechanicville, NY (US);
Sunil Kumar Singh, Mechanicville, NY (US);
Shesh Mani Pandey, Saratoga Springs, NY (US);
Assignee:
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 29/78 (2006.01); H01L 23/532 (2006.01); H01L 29/66 (2006.01); H01L 29/49 (2006.01);
U.S. Cl.
CPC ...
H01L 29/785 (2013.01); H01L 23/53252 (2013.01); H01L 29/4975 (2013.01); H01L 29/6656 (2013.01); H01L 29/66795 (2013.01);
Abstract
During formation of a trench silicide contact, a sacrificial layer is incorporated into the trench directly over source/drain junctions prior to metallization of the trench. Selective removal of the sacrificial layer widens the trench proximate to the source/drain junctions, increasing the contact area and correspondingly decreasing the contact resistance between the source/drain junctions and a silicide layer.