The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2018
Filed:
May. 22, 2017
Globalfoundries Inc., Grand Cayman, KY;
Shiv Kumar Mishra, Mechanicville, NY (US);
Sunil Kumar Singh, Mechanicville, NY (US);
Shesh Mani Pandey, Saratoga Springs, NY (US);
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Abstract
During formation of a trench silicide contact, a sacrificial layer is incorporated into the trench directly over source/drain junctions prior to metallization of the trench. Selective removal of the sacrificial layer widens the trench proximate to the source/drain junctions, increasing the contact area and correspondingly decreasing the contact resistance between the source/drain junctions and a silicide layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile