The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 25, 2018

Filed:

Sep. 01, 2017
Applicant:

Kabushiki Kaisha Toshiba, Minato-ku, JP;

Inventors:

Shunsuke Asaba, Kawasaki, JP;

Teruyuki Ohashi, Himeji, JP;

Assignee:

Kabushiki Kaisha Toshiba, Minato-ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/15 (2006.01); H01L 31/0328 (2006.01); H01L 21/8238 (2006.01); H01L 21/336 (2006.01); H01L 29/16 (2006.01); H01L 29/78 (2006.01); H01L 29/10 (2006.01); H01L 29/06 (2006.01); H01L 29/739 (2006.01); H02M 7/537 (2006.01); H02P 27/06 (2006.01); B66B 11/04 (2006.01); B61C 3/00 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1608 (2013.01); H01L 29/0611 (2013.01); H01L 29/1095 (2013.01); H01L 29/7802 (2013.01); B60L 2210/42 (2013.01); B61C 3/00 (2013.01); B66B 11/043 (2013.01); H01L 29/7395 (2013.01); H02M 7/537 (2013.01); H02P 27/06 (2013.01);
Abstract

A semiconductor device of an embodiment includes first and second electrodes, a first gate electrode, a semiconductor layer disposed between the first electrode and a band gap of the semiconductor layer being wider than a band gap of silicon, a silicon layer between the semiconductor layer and the first electrode, a metal layer between the semiconductor layer and the silicon layer, a first semiconductor region of a first-conductivity type in the semiconductor layer, a first silicon region of the first-conductivity type in the silicon layer, a second silicon region of a second-conductivity type in the first silicon region, a third silicon region of the second-conductivity type in the first silicon region and separated from the second silicon region, a first gate insulating layer, a fourth silicon region of the first-conductivity type in the second silicon region, and a fifth silicon region in the third silicon region.


Find Patent Forward Citations

Loading…