The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2018
Filed:
Mar. 21, 2017
Applicant:
SK Hynix Inc., Gyeonggi-do, KR;
Inventor:
Woo Yung Jung, Seoul, KR;
Assignee:
SK Hynix Inc., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/308 (2006.01); H01L 21/3065 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3065 (2013.01); H01L 21/3083 (2013.01); H01L 21/30655 (2013.01); H01L 21/31144 (2013.01);
Abstract
A method for forming patterns is provided. The method includes forming a resist layer on a substrate, imprinting a convex pattern and a concave pattern on the resist layer using a template, forming a silicon diffusion layer containing silicon containing diffusion species in an upper portion of the convex pattern, and selectively removing a recessed portion of the resist layer under the concave pattern using the silicon diffusion layer as an etch mask.