The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2018
Filed:
Feb. 04, 2013
Valery Godyak, Brookline, MA (US);
Valery Godyak, Brookline, MA (US);
Other;
Abstract
Methods and apparatus for improved inductively coupled plasma sources are disclosed. A remote linear plasma source can have a plurality of coil segments operable to power intense localized radiofrequency plasma current channels along inner surfaces of a chamber. A plurality of localized intense plasma current channels within a single chamber provides a relatively large active plasma volume, improves efficiency, and provides for favorable residence time and feed gas distribution in a plasma source. In various embodiments, a remote plasma source operable to generate active species is useful for applications such as chamber cleaning, processing materials, ion, electron, and/or neutral beam sources, gaseous discharge lamps, fluorescent lighting, gaseous lasers, and others.