The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2018
Filed:
Feb. 18, 2014
Fachhochschule Muenster, Muenster, DE;
Alexander Riedl, Steinfurt, DE;
FACHHOCHSCHULE MUENSTER, Muenster, DE;
Abstract
The invention relates to a method for producing a sealing element, in particular a sealing ring, for sealing a connection of two flanges, of which at least one has a non-plane sealing surface, wherein at a plurality of circumferential positions (UPto UPn) lying in the circumferential direction of at least one flange, preferably of both flanges, in particular circumferential positions that are equidistant from each other, a distance value between the sealing surfaces of the flanges facing each other is determined at several locations that lie one behind the other in a direction perpendicular to the circumferential tangent, in particular in a radial direction, for each of the circumferential positions and a single thickness value is determined from the several distance values of each circumferential position and a sealing element is produced in dependence on all thickness values, which depend on the circumferential position, which sealing element has a thickness that depends on the circumferential position, which thickness is constant at each of the circumferential positions corresponding to the flanges in a direction perpendicular to the circumferential tangent, in particular in the radial direction, and corresponds to the determined thickness value of the respective circumferential position.