The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2018
Filed:
Mar. 16, 2012
Jinhyouk Shin, Changwon-si, KR;
Jeonggyu Kim, Changwon-si, KR;
Kwangho Lee, Changwon-si, KR;
Jangwoo Lee, Changwon-si, KR;
Moonkap Lee, Changwon-si, KR;
Junggeun OH, Changwon-si, KR;
Jinhyouk Shin, Changwon-si, KR;
Jeonggyu Kim, Changwon-si, KR;
Kwangho Lee, Changwon-si, KR;
Jangwoo Lee, Changwon-si, KR;
Moonkap Lee, Changwon-si, KR;
Junggeun Oh, Changwon-si, KR;
LG ELECTRONICS INC., Seoul, KR;
Abstract
There is disclosed a plasma enhanced chemical vapor deposition apparatus including a chamber in which plasma reaction is performed to provide a functional film to an object received therein, a pallet mechanically and electrically connected with the object, a conveyer to convey the pallet to an inside from an outside of the chamber, and a power supplier to supply an electric power to the pallet, the power supplier comprising a moving contact distant from the pallet when the pallet is conveyed and contacting with the pallet when the pallet is stopped.