The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 18, 2018

Filed:

Aug. 23, 2016
Applicant:

Disney Enterprises, Inc., Burbank, CA (US);

Inventors:

Cen Rao, Newtown, PA (US);

Ximin Gong, Belle Mead, NJ (US);

Nikhil Deshpande, Pennington, NJ (US);

Ilke Akin, Morrisville, PA (US);

Assignee:

Disney Enterprises, Inc., Burbank, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N 21/81 (2011.01); H04N 21/2187 (2011.01); G06T 19/00 (2011.01); H04N 21/234 (2011.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
H04N 21/8146 (2013.01); G06T 7/0081 (2013.01); G06T 19/006 (2013.01); H04N 21/2187 (2013.01); H04N 21/23418 (2013.01); G06T 2207/10016 (2013.01); G06T 2207/20144 (2013.01); G06T 2207/30204 (2013.01);
Abstract

One embodiment provides a method for rendering a virtual mark on a video frame, including: receiving the video frame, captured by a camera, comprising a scene; obtaining a three-dimensional model of a mark in the scene; obtaining a foreground mask of the video frame; denoting a predetermined region corresponding to a mark mask, wherein the mark mask is an image projection of the mark on the video frame; updating the mark mask to exclude foreground regions, wherein the updating comprises: partitioning the predetermined region into a plurality of segments; and filtering out, from the mark mask, foreground pixels based on the plurality of segments and the foreground mask; and rendering, on the video frame, the virtual mark using the updated mark mask. Other aspects are described and claimed.


Find Patent Forward Citations

Loading…