The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2018
Filed:
May. 31, 2017
Applicants:
Ryo Miyakoshi, Kanagawa, JP;
Hidetoshi Fujii, Kanagawa, JP;
Akira Izutani, Osaka, JP;
Daisuke Asahina, Kanagawa, JP;
Inventors:
Ryo Miyakoshi, Kanagawa, JP;
Hidetoshi Fujii, Kanagawa, JP;
Akira Izutani, Osaka, JP;
Daisuke Asahina, Kanagawa, JP;
Assignee:
RICOH COMPANY, LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 15/16 (2006.01); B29C 47/00 (2006.01); B29K 71/00 (2006.01); B29K 77/00 (2006.01); B29K 105/00 (2006.01); B29L 7/00 (2006.01); B29L 31/00 (2006.01);
U.S. Cl.
CPC ...
G03G 15/162 (2013.01); B29C 47/0004 (2013.01); B29K 2071/02 (2013.01); B29K 2077/00 (2013.01); B29K 2105/0023 (2013.01); B29K 2105/0085 (2013.01); B29K 2427/16 (2013.01); B29L 2007/007 (2013.01); B29L 2031/767 (2013.01); G03G 2215/00683 (2013.01);
Abstract
A member for an image forming apparatus includes a surface layer including a block copolymer, wherein the block copolymer includes a polyamide block and a polyether block and the composition ratio of the polyether block to the polyamide block is from 0.2 to 1.5.