The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2018
Filed:
Jul. 07, 2010
Günther Vulpius, Riedstadt, DE;
Götz Peter Hellmann, Mainz, DE;
Peter Wolfgang Andreas Spahn, Hanau, DE;
Günther Vulpius, Riedstadt, DE;
Götz Peter Hellmann, Mainz, DE;
Peter Wolfgang Andreas Spahn, Hanau, DE;
DE LA RUE INTERNATONAL LIMITED, Hampshire, GB;
Abstract
A method of forming a film of photonic crystal material. A first process is performed upon a material capable of having a photonic crystal structure, this process causing deformation of the material so as to form a film in which incident light received by the material is selectively reflected or transmitted to generate a first optical effect in the film. A second process is performed upon substantially all of the film which applies a shear stress to the film. This causes a change in the material structure so as to generate a second optical effect in the film, different from the first optical effect, in response to incident light. Security films, devices, articles and documents formed using the method are also discussed.