The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2018
Filed:
Oct. 05, 2015
Skyworks Solutions (Hong Kong) Limited, Hong Kong, CN;
Advanced Analogic Technologies Incorporated, San Jose, CA (US);
Wai Tien Chan, Hong Kong, CN;
Donald Ray Disney, Cupertino, CA (US);
Richard K. Williams, Cupertino, CA (US);
SKYWORKS SOLUTIONS (HONG KONG) LIMITED, Hong Kong, CN;
ADVANCED ANALOGIC TECHNOLOGIES INCORPORATED, San Jose, CA (US);
Abstract
An isolation structure formed in a semiconductor substrate of a first conductivity type includes a region of a second conductivity type opposite to the first conductivity type. The region of the second conductivity type is saucer-shaped and has a floor portion substantially parallel to the top surface of the substrate and a sloped sidewall portion. The sloped sidewall portion extends downward from the top surface of the substrate at an oblique angle and merges with the floor portion. The floor portion and the sloped sidewall portion together form an isolated pocket of the substrate.