The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2018
Filed:
Mar. 05, 2013
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Blake Koelmel, Mountain View, CA (US);
Nyi O. Myo, San Jose, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/687 (2006.01); C23C 16/458 (2006.01); C23C 16/52 (2006.01); C23C 16/54 (2006.01); H01J 37/32 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68742 (2013.01); C23C 16/4584 (2013.01); C23C 16/52 (2013.01); C23C 16/54 (2013.01); H01J 37/32733 (2013.01); H01L 21/6838 (2013.01); H01L 21/68785 (2013.01); H01J 2237/2001 (2013.01);
Abstract
Embodiments of the present invention provide apparatus and methods for supporting, positioning or rotating a semiconductor substrate during processing. One embodiment of the present invention provides a method for processing a substrate comprising positioning the substrate on a substrate receiving surface of a susceptor, and rotating the susceptor and the substrate by delivering flow of fluid from one or more rotating ports.