The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2018
Filed:
Jul. 10, 2017
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Tom E. Blomberg, Vantaa, FI;
Jaakko Anttila, Helsinki, FI;
Assignee:
ASM IP HOLDING B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/285 (2006.01); C23C 16/34 (2006.01); C23C 16/455 (2006.01); H01L 23/532 (2006.01); H01L 21/28 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28556 (2013.01); C23C 16/34 (2013.01); C23C 16/45531 (2013.01); C23C 16/45536 (2013.01); C23C 16/45553 (2013.01); H01L 21/28088 (2013.01); H01L 21/76843 (2013.01); H01L 23/53238 (2013.01);
Abstract
In one aspect, methods of forming smooth ternary metal nitride films, such as TiWNfilms, are provided. In some embodiments, the films are formed by an ALD process comprising multiple super-cycles, each super-cycle comprising two deposition sub-cycles. In one sub-cycle a metal nitride, such as TiN is deposited, for example from TiCland NH, and in the other sub-cycle an elemental metal, such as W, is deposited, for example from WFand SiH. The ratio of the numbers of each sub-cycle carried out within each super-cycle can be selected to achieve a film of the desired composition and having desired properties.