The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2018
Filed:
Mar. 27, 2015
Applicant:
National Technology & Engineering Solutions of Sandia, Llc, Albuquerque, NM (US);
Inventors:
James E. Stevens, Albuquerque, NM (US);
Patrick R. Mickel, Albuquerque, NM (US);
Andrew Lohn, Santa Monica, CA (US);
Matthew Marinella, Albuquerque, NM (US);
Assignee:
National Technology & Engineering Solutions of Sandia, LLC, Albuquerque, NM (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); C23C 14/3492 (2013.01);
Abstract
The present invention relates to systems and methods for preparing reactively sputtered films. The films are generally thin transition metal oxide (TMO) films having an optimum stoichiometry for any useful device (e.g., a sub-stoichiometric thin film for a memristor device). Described herein are systems, methods, and calibrations processes that employ rapid control of partial pressures to obtain the desired film.