The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2018
Filed:
Apr. 24, 2015
Lg Display Co., Ltd., Seoul, KR;
Bayer Materialscience Ag, Leverkusen, DE;
Hyungseok Bang, Goyang-si, KR;
Heejin Im, Paju-si, KR;
Guensik Lee, Seoul, KR;
Friedrich-Karl Bruder, Krefeld, DE;
Thomas Peter Facke, Leverkusen, DE;
Marc-Stephan Weiser, Leverkusen, DE;
Rainer Hagen, Leverkusen, DE;
Thomas Rolle, Leverkusen, DE;
Horst Berneth, Leverkusen, DE;
Dennis Honel, Zülpich, DE;
Günther Walze, Köln, DE;
LG Display Co., Ltd., Seoul, KR;
Bayer MaterialScience AG, Leverkusen, DE;
Abstract
The invention relates to a method for producing a holographic optical element by providing a recording stack comprising at least one recording element laminated on at least one supporting element, irradiating at least a part of the recording stack with at least one recording beam in an irradiating step, wherein during the irradiating step, the recording stack bends, providing a bending deviation threshold for the recording stack, and adjusting at least one first process parameter such that an expected maximum bending deviation of the recording stack does not exceed the bending deviation threshold, wherein the at least one first process parameter influences the bending behavior of the recording stack during the irradiating step.