The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 2018

Filed:

Feb. 17, 2016
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Nam Jib Park, Daejeon, KR;

Sang Ho Lee, Daejeon, KR;

Se Yeong Ju, Daejeon, KR;

Sung Ho Lee, Daejeon, KR;

Sung Tae Ahn, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 71/12 (2006.01); C08L 77/00 (2006.01); C08L 77/06 (2006.01);
U.S. Cl.
CPC ...
C08L 77/06 (2013.01); C08L 71/123 (2013.01); C08L 71/126 (2013.01); C08L 2205/035 (2013.01); C08L 2205/06 (2013.01); C08L 2207/53 (2013.01);
Abstract

Disclosed is a poly(arylene ether) resin composition, and more specifically, a modified poly(arylene ether) resin composition including a poly(arylene ether) resin, a poly(arylene ether) resin modified with unsaturated carboxylic acid or an anhydride thereof, a polyamide resin, a polyolefin resin, and an encapsulating agent, wherein the polyolefin resin is encapsulated by the encapsulating agent with the poly(arylene ether) resin and the poly(arylene ether) resin modified with unsaturated carboxylic acid or an anhydride thereof, and a molded article produced therefrom. The disclosed composition has an effect of providing a modified poly(arylene ether) resin composition which has less change in physical properties caused by moisture, and has low specific gravity and superior impact strength, weatherability and balance in physical properties.


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