The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 2018

Filed:

Jun. 16, 2014
Applicant:

Siemens Aktiengesellschaft, München, DE;

Inventors:

Olga Deiss, Düsseldorf, DE;

Bernd Reinarz, Meerbusch, DE;

Jaap Van Kampen, Ar Roermond, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2018.01); B29C 67/00 (2017.01); G05B 19/4099 (2006.01); B29C 64/153 (2017.01); B29C 64/386 (2017.01); B33Y 10/00 (2015.01); B33Y 50/02 (2015.01);
U.S. Cl.
CPC ...
B29C 67/0077 (2013.01); B29C 64/153 (2017.08); B29C 64/386 (2017.08); G05B 19/4099 (2013.01); B33Y 10/00 (2014.12); B33Y 50/02 (2014.12); G05B 2219/35134 (2013.01); G05B 2219/49007 (2013.01);
Abstract

An adaptation method for a modelling method in which, by means of target geometry, model geometry, which is derived from the target geometry, is created for an object to be produced by a selective laser melting method is provided. In the adaptation method, adapted model geometry is produced from the derived model geometry by dimension adaptation by means of a correction factor and/or by geometry adaptation by means of correction geometry.


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