The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2018
Filed:
Dec. 04, 2017
CI Systems (Israel) Ltd., Migdal Ha'emek, IL;
CI SYSTEMS (ISRAEL) LTD., Migdal Ha'emek, IL;
Abstract
A method reduces drift induced by environment changes when imaging radiation from a scene in two wavelength bands. Scene radiation is focused by two wedge-shaped components through a lens onto a detector that includes three separate regions. The wedge-shaped components are positioned at a fixed distance from the lens. The radiation from the scene is imaged separately onto two of the detector regions through an f-number of less than approximately 1.5 to produce a first pixel signal. Imaged radiation on each of the two regions includes radiation in one respective wavelength band. Radiation from a radiation source is projected by at least one of the wedge-shaped components through the lens onto a third detector region to produce a second pixel signal. The first pixel signal is modified based on a predetermined function that defines a relationship between second pixel signal changes and first pixel signal changes induced by environment changes.