The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 04, 2018

Filed:

Feb. 11, 2015
Applicant:

Ilsoled Co., Ltd., Buk-gu, Gwangju, KR;

Inventor:

Tae Won Kim, Gwangju, KR;

Assignee:

ILSOLED CO., LTD., Buk-gu, Gwangju, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/00 (2006.01); H01L 51/56 (2006.01); B01D 7/00 (2006.01); B01D 9/00 (2006.01); C07C 209/84 (2006.01); C07C 211/54 (2006.01); H01L 51/50 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0025 (2013.01); B01D 7/00 (2013.01); B01D 9/005 (2013.01); C07C 209/84 (2013.01); C07C 211/54 (2013.01); H01L 51/56 (2013.01); B01D 2009/0086 (2013.01); H01L 51/006 (2013.01); H01L 51/0058 (2013.01); H01L 51/5056 (2013.01);
Abstract

A method of purifying an organic material using an ionic liquid according to the present invention includes a sublimation step (S) of sublimating the organic material containing an impurity, a capturing step (S) of bringing a sublimated gas of the organic material into contact with the flowing ionic liquid to capture the sublimated gas, and a recrystallization step (S) of preferentially oversaturating the organic material, which is to be purified, of the sublimated gas, which is captured in the ionic liquid to be dissolved, to thus generate the recrystallized organic material. In the present invention, it is not necessary to perform a process of carrying the sublimated gas, which is generated during the sublimation step, to implement reverse sublimation. Accordingly, there is a merit in that the contamination of a purified sample by an inert carrier gas, which is used in a conventional sublimation purification method, is fundamentally avoided.


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