Wafer loading apparatus of wafer polishing equipment and method for adjusting wafer loading position

Abstract

An embodiment relates to a wafer loading apparatus of wafer polishing equipment. Provided is the wafer loading apparatus of wafer polishing equipment, comprising: a wafer polisher that includes a polishing carrier having a wafer hole formed therein in which a wafer is loaded, wherein both sides of the wafer are polished by top and bottom boards; a wafer transferrer that includes a transfer arm disposed above the polishing carrier to transfer the wafer, wherein a transfer plate corresponding to a shape of the wafer is connected to one end the transfer arm; a wafer position detector mounted on a bottom surface of the transfer plate to detect a position of the wafer hole; a plurality of wafer attachment/detachment units formed on an edge portion of the transfer plate; a wafer aligner mounted on a top surface of the transfer plate to align the wafer; and a controller to which data on the position of the wafer hole, which is detected by the wafer position detector, is transmitted and which calculates a position where the wafer is to be loaded by the wafer attachment/detachment unit and the wafer aligner.