The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 04, 2018

Filed:

Jun. 29, 2014
Applicant:

Hoya Corporation, Tokyo, JP;

Inventor:

Yoshihiro Tawara, Hokuto, JP;

Assignee:

HOYA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 15/02 (2006.01); G11B 5/84 (2006.01); C03C 19/00 (2006.01); C03C 23/00 (2006.01); G11B 5/73 (2006.01); B24B 37/04 (2012.01); B24B 37/08 (2012.01); C09K 3/14 (2006.01); G11B 5/62 (2006.01);
U.S. Cl.
CPC ...
G11B 5/8404 (2013.01); B24B 37/044 (2013.01); B24B 37/08 (2013.01); C03C 19/00 (2013.01); C03C 23/00 (2013.01); C09K 3/1409 (2013.01); C09K 3/1454 (2013.01); G11B 5/62 (2013.01); G11B 5/73 (2013.01); G11B 5/84 (2013.01); C03C 15/02 (2013.01);
Abstract

The present invention provides a method for manufacturing a glass substrate for a magnetic disk or the like according to which surface roughnesses of main surfaces of a glass substrate can be reduced more than with currently available methods. In the present invention, by mirror-polishing (final finishing-polishing) the main surfaces of the glass substrate used in a magnetic disk, for example, using a polishing liquid containing organic-based particles made of a styrene-based resin, an acrylic resin, or a urethane-based resin, as polishing abrasive particles, surface roughnesses of the main surfaces of the substrate can be reduced more than with currently available methods.


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