The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2018
Filed:
Jul. 20, 2015
Applicant:
Boe Technology Group Co., Ltd., Beijing, CN;
Inventors:
Seiji Fujino, Beijing, CN;
Song Zhang, Beijing, CN;
Tao Wang, Beijing, CN;
Jing Gao, Beijing, CN;
Xiaobo Du, Beijing, CN;
Assignee:
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/38 (2012.01); G03F 1/76 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/76 (2013.01); G03F 1/38 (2013.01); G03F 7/70058 (2013.01);
Abstract
The present disclosure provides a mask plate, a mask exposure device and a mask exposure method, belongs to the field of display technology. The mask plate includes a tray with at least one mask locating slot, and a mask is arranged in each mask locating slot. By the mask plate, the mask exposure device and the mask exposure method provided by the present disclosure, an effective mask with a closed-loop shaped opening may be provided, thereby improving a quality of a film formed on a substrate.