The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 04, 2018

Filed:

Jul. 28, 2016
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Yohei Ishida, Kawasaki, JP;

Tamaki Kobayashi, Isehara, JP;

Tomoaki Ichimura, Kawasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01T 1/20 (2006.01); C30B 25/02 (2006.01); C30B 29/12 (2006.01); C30B 29/60 (2006.01); C30B 33/00 (2006.01); G01T 1/202 (2006.01);
U.S. Cl.
CPC ...
G01T 1/2018 (2013.01); C30B 25/02 (2013.01); C30B 29/12 (2013.01); C30B 29/605 (2013.01); C30B 33/00 (2013.01); G01T 1/202 (2013.01);
Abstract

A method of manufacturing a scintillator, includes growing a scintillator layer constituted by a plurality of column crystals on a base, forming a first protection film so as to cover the scintillator layer, planarizing the first protection film, the planarizing including a polishing process of polishing the first protection film, and forming a second protection film configured to cover the first protection film that has undergone the planarizing. The scintillator layers grown on the base include an abnormally grown portion. In the polishing process, a front end of the abnormally grown portion is polished as well as a surface of the first protection film so as to form a continuation surface by the surface of the first protection film and a surface of the abnormally grown portion.


Find Patent Forward Citations

Loading…