The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 04, 2018

Filed:

Feb. 14, 2018
Applicant:

King Abdullah University of Science and Technology, Thuwal, SA;

Inventors:

Daliang Zhang, Thuwal, SA;

Yu Han, Thuwal, SA;

Kun Li, Thuwal, SA;

Yihan Zhu, Thuwal, SA;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/04 (2018.01); H01J 37/28 (2006.01); G01N 23/20058 (2018.01); H01J 37/26 (2006.01); H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
G01N 23/20058 (2013.01); G01N 23/04 (2013.01); H01J 37/244 (2013.01); H01J 37/263 (2013.01); H01J 37/28 (2013.01); H01J 2237/2802 (2013.01); H01J 2237/2823 (2013.01);
Abstract

A system and method involve applying an electron beam to a sample and obtaining an image of the sample with the applied electron beam. An orientation of the sample relative to the sample's zone axis is automatically determined based on a distribution of reflections in the image. The orientation of the sample is automatically adjusted to align with the sample's zone axis based on the determined orientation.


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