The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2018
Filed:
Sep. 09, 2016
J.a. Woollam Co., Inc, Lincoln, NE (US);
Martin M. Liphardt, Lincoln, NE (US);
Ping He, Lincoln, NE (US);
J.A. WOOLLAM CO., INC, Lincoln, NE (US);
Abstract
A system for providing variable wavelength intensity attenuation to said focused beams by application of an aperture-like element that comprises at least two regions of 'filter' material, or comprises different materials graded into one another, which different materials that have different responses to different wavelengths, wherein said system is applied to reduce differences in wavelength intensity levels when applied in collimated portions of a beam as a Spectral Angle Adjustor (SAA) or to preserve information in a beam while changing said beam effective diameter as a Spectral Aperture Stop (SAS); or to affect a Spectral Field Stop (SFS) that controls source image size when applied at a convergent/divergent beam focal point as a Spectrally Varying Aperture, (SVA) the end result depending on where in a beam it is applied.