The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 04, 2018

Filed:

Nov. 08, 2013
Applicant:

Halliburton Energy Services, Inc., Houston, TX (US);

Inventors:

Shantel J Stone, Conroe, TX (US);

Ryan Patrick Collins, Spring, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09K 8/68 (2006.01); C09K 8/035 (2006.01); C09K 8/12 (2006.01); C09K 8/52 (2006.01); C08L 71/02 (2006.01); C08K 3/34 (2006.01);
U.S. Cl.
CPC ...
C09K 8/035 (2013.01); C08K 3/34 (2013.01); C08L 71/02 (2013.01); C09K 8/12 (2013.01); C09K 8/52 (2013.01); C09K 8/68 (2013.01);
Abstract

Various embodiments disclosed relate to hydroxy-terminated poly(alkylene oxide) copolymer surfactants for use downhole, downhole compositions including the same, and methods of using the same. In various embodiments, the present invention provides a method of treating a subterranean formation. The method can include obtaining or providing a composition including a hydroxy-terminated poly(alkylene oxide) copolymer surfactant. The copolymer surfactant can include a first repeating unit having the structure —[RO]—, wherein at each occurrence Ris independently a substituted or unsubstituted (C-C)alkylene group. The copolymer surfactant can include a second repeating unit having the structure —[RO]—, wherein at each occurrence Ris independently a substituted or unsubstituted (C-C)alkylene group. The first repeating unit can have a lower molecular weight than the second repeating unit. The first repeating unit and the second repeating unit can have a random copolymer or block copolymer arrangement in the copolymer surfactant. The method can also include placing the composition in a subterranean formation downhole.


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