The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2018
Filed:
Jan. 13, 2016
Sekisui Chemical Co., Ltd., Osaka, JP;
Satoshi Koma, Tokyo, JP;
SEKISUI CHEMICAL CO., LTD., Osaka, JP;
Abstract
A butadiene production system and a butadiene production method are provided in which the yield is high and environmental load can be reduced. The butadiene production system () includes: a gas preparation device () that heats raw materials to prepare a mixed gas including hydrogen and carbon monoxide; an ethanol production device () that is provided downstream of the gas preparation device () and brings the mixed gas into contact with a first catalyst to obtain ethanol; a butadiene production device () that is provided downstream of the ethanol production device () and brings the ethanol into contact with a second catalyst to obtain butadiene; and return means () for returning hydrogen, ethylene, and the like, which are produced as by-products in the butadiene production device (), to the gas preparation device (). In addition, in the butadiene production method, the butadiene production system () is used.