The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2018
Filed:
Nov. 13, 2012
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Harunobu Matsui, Joetsu, JP;
Daijitsu Harada, Joetsu, JP;
Atsushi Watabe, Joetsu, JP;
Shuhei Ueda, Joetsu, JP;
Masaki Takeuchi, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 37/04 (2012.01); B24D 3/28 (2006.01); B24B 37/24 (2012.01);
U.S. Cl.
CPC ...
B24B 37/042 (2013.01); B24B 37/044 (2013.01); B24B 37/24 (2013.01); B24D 3/28 (2013.01);
Abstract
A substrate is prepared by polishing a surface of the substrate using a polishing pad while feeding a slurry. The polishing pad has a porous nap layer which comes in contact with the substrate surface and is made of a base resin comprising at least three resins, typically an ether resin, ester resin, and polycarbonate resin. The polished substrate has a highly flat surface with a minimal number of defects.