The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 28, 2018

Filed:

Mar. 14, 2017
Applicant:

Sii Semiconductor Corporation, Chiba, JP;

Inventors:

Takaaki Hioka, Chiba, JP;

Mika Ebihara, Chiba, JP;

Hiroshi Takahashi, Chiba, JP;

Matsuo Kishi, Chiba, JP;

Miei Takahama, Chiba, JP;

Assignee:

ABLIC INC., Chiba, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 43/04 (2006.01); H01L 43/06 (2006.01); H01L 43/14 (2006.01); G01R 33/07 (2006.01); G01R 33/00 (2006.01);
U.S. Cl.
CPC ...
H01L 43/065 (2013.01); G01R 33/0052 (2013.01); G01R 33/07 (2013.01); H01L 43/14 (2013.01);
Abstract

The magnetic sensor includes a semiconductor substrate having Hall elements on a front surface of the semiconductor substrate, a conductive layer formed on a back surface of the semiconductor substrate, and a magnetic flux converging plate formed on the conductive layer. The magnetic flux converging plate is formed on the back surface of the semiconductor substrate through formation of the base conductive layer on the back surface of the semiconductor substrate, formation of a resist on the base conductive layer having an opening for forming the magnetic flux converging plate, formation of the magnetic flux converging plate in the opening of the resist by electroplating, removal of the resist, and removal of a part of the base conductive layer by etching with the magnetic flux converging plate as a mask.


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