The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 28, 2018

Filed:

Sep. 20, 2017
Applicant:

Anchor Semiconductor Inc., Santa Clara, CA (US);

Inventors:

Khurram Zafar, San Jose, CA (US);

Chenmin Hu, Saratoga, CA (US);

Ye Chen, San Jose, CA (US);

Yue Ma, San Jose, CA (US);

Chingyun Hsiang, Cupertino, CA (US);

Justin Chen, Milpitas, CA (US);

Raymond Xu, Sunnyvale, CA (US);

Abhishek Vikram, Santa Clara, CA (US);

Ping Zhang, Saratoga, CA (US);

Assignee:

Anchor Semiconductor Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 7/00 (2017.01); G06K 9/46 (2006.01); G06K 9/62 (2006.01); G06K 9/52 (2006.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06K 9/4604 (2013.01); G06K 9/4671 (2013.01); G06K 9/52 (2013.01); G06K 9/6201 (2013.01); G06K 2009/4666 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30148 (2013.01);
Abstract

Tracking patterns during a semiconductor fabrication process includes: obtaining an image of a portion of a fabricated device; extracting contours of the portion of the fabricated device from the obtained image; aligning the extracted contour to a matching section of a reference design; decomposing the matching section of the reference design into one or more patterns; and updating a pattern tracking database with information pertaining to at least one pattern in the one or more patterns generated as a result of the decomposition.


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