The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2018
Filed:
Oct. 24, 2016
Hrl Laboratories, Llc, Malibu, CA (US);
Sophia S. Yang, Lynnwood, WA (US);
Alan J. Jacobsen, Woodland Hills, CA (US);
Joanna A. Kolodziejska, Oak Park, CA (US);
Robert E. Doty, Los Angeles, CA (US);
William Carter, Calabasas, CA (US);
Jacob M. Hundley, Newbury Park, CA (US);
HRL Laboratories, LLC, Malibu, CA (US);
Abstract
A system for fabricating micro-truss structures. A reservoir holds a volume of a liquid photomonomer configured to polymerize to form a photopolymer when exposed to suitable light such as ultraviolet light. A mask at the bottom of the reservoir includes a plurality of apertures. Light enters the reservoir through each aperture from several directions, forming a plurality of self-guided photopolymer waveguides within the reservoir. The light is supplied by one or more sources of collimated light. A plurality of mirrors may reflect the light from a single source of collimated light to form a plurality of collimated beams, that illuminate the photomonomer in the reservoir, through the mask, from a corresponding plurality of directions, to form a micro-truss structure including a plurality of self-guided waveguide members.