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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10061197 B1

PDFFull Text
Date of Patent:
Aug. 28, 2018

Filed:

Jul. 09, 2015

Light irradiation device and method for patterning self assembled monolayer

Applicant:

Ushio Denki Kabushiki Kaisha, Tokyo, JP;

Inventors:

Tatsushi Owada, Tokyo, JP;

Shinji Suzuki, Tokyo, JP;

Assignee:

USHIO DENKI KABUSHIKI KAISHA, Tokyo, JP;

Attorney:

Studebaker & Brackett PC

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
H01J 61/16 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01); H05B 41/34 (2006.01); H01J 61/90 (2006.01); G03F 7/00 (2006.01); G03F 7/16 (2006.01); H01S 3/225 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2004 (2013.01); G03F 7/0002 (2013.01); G03F 7/165 (2013.01); G03F 7/168 (2013.01); G03F 7/7015 (2013.01); G03F 7/70041 (2013.01); G03F 7/70466 (2013.01); H01J 61/16 (2013.01); H01J 61/90 (2013.01); H01L 21/0274 (2013.01); H01S 3/225 (2013.01); H01S 3/2253 (2013.01); H01S 3/2255 (2013.01); H05B 41/34 (2013.01);
Abstract

Disclosed herein a vacuum ultra violet light source device that is capable of suppressing an amount of ozone generation when the vacuum ultra violet light is emitted into an atmosphere containing oxygen, a light irradiation device incorporating the vacuum ultra violet light device, and a method of patterning a self-assembled monolayer employing the light irradiation device. The light irradiation device is configured to irradiate a self-assembled monolayer (SAM) formed on a workpiece with light containing vacuum ultra violet light through a mask M on which a prescribed pattern is formed so as to perform a patterning process of the SAM. The light containing the vacuum ultra violet light to be irradiated onto the SAM is light that is pulsed light and has a duty ratio of light emission equal to or greater than 0.00001 and equal to or less than 0.01.

Find Patent Forward Citations

Owada, Tatsushi. (2018). Light irradiation device and method for patterning self assembled monolayer (U.S. Patent No. 10061197). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10061197

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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