The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2018
Filed:
Nov. 17, 2016
Fujifilm Corporation, Minato-ku, Tokyo, JP;
Yuzo Fujiki, Shizuoka, JP;
Shigekazu Suzuki, Shizuoka, JP;
FUJIFILM CORPORATION, Tokyo, JP;
Abstract
A photosensitive composition, a method for producing a cured film using the photosensitive composition, a cured film prepared by curing the photosensitive composition, and a touch panel and a display device that use the cured film are provided. The photosensitive composition contains: a compound having two or more ethylenically unsaturated groups; a photopolymerization initiator; a polymer A1 containing a constitutional unit a1 represented by the following Formula 1 and a constitutional unit a2 having a carboxylic acid anhydride structure; particles; and a solvent. A molar content ratio of the constitutional unit a1 to the constitutional unit a2 in the polymer A1 is in a range of a1:a2=3:1 to 6:1. An acid anhydride value of the polymer A1 is from 1.30 to 3.00 mmol/g. A number average primary particle size of the particles is from 10 to 200 nm.