The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2018
Filed:
May. 23, 2016
Honeywell International Inc., Morris Plains, NJ (US);
David Loeffelholz, Long Beach, CA (US);
HONEYWELL INTERNATIONAL INC., Morris Plains, NJ (US);
Abstract
A system for building a gas processing apparatus includes a compressed gas source, a pressure modulator in communication with the gas source, and a chamber configured to receive a gas permeable material. The chamber is further configured with a first chamber area on one side of the material and with a second chamber area on a second side of the material. A sensor is configured to measure over time a pressure differential between the first and second chamber areas. A memory stores performance characteristic data for a plurality of gas processing apparatus. A processor converts the pressure differential to a material characteristic of the gas permeable material, and compares the material characteristic to at least one selected performance characteristic of the gas processing apparatus.