The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2018
Filed:
Jan. 21, 2016
Integran Technologies Inc., Mississauga, CA;
Gino Palumbo, Toronto, CA;
Iain Brooks, Toronto, CA;
Klaus Tomantschger, Mississauga, CA;
Peter Lin, Toronto, CA;
Karl Aust, Toronto, CA;
Nandakumar Nagarajan, Burlington, CA;
Francisco Gonzalez, Toronto, CA;
INTEGRAN TECHNOLOGIES INC., Mississauga, CA;
Abstract
Polycrystalline materials are prepared by electrodeposition of a precursor material that is subsequently heat-treated to induce at least a threefold increase in the grain size of the material to yield a relatively high fraction of 'special' low Σ grain boundaries and a randomized crystallographic texture. The precursor metallic material has sufficient purity and a fine-grained microstructure (e.g., an average grain size of 4 nm to 5 μm). The resulting metallic material is suited to the fabrication of articles requiring high mechanical or physical isotropy and/or resistance to grain boundary-mediated deformation or degradation mechanisms.